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Volumn 2006, Issue , 2006, Pages 709-717

Investigation of Cu/low-k film delamination in flip chip packages

Author keywords

[No Author keywords available]

Indexed keywords

CHIP PACKAGE INTERACTION (CPI); GLOBAL ANALYSIS; PACKAGE UNDERFILL MATERIALS; PACKAGE UNDERFILL MODULUS;

EID: 33845571757     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2006.1645735     Document Type: Conference Paper
Times cited : (57)

References (15)
  • 3
    • 33845583638 scopus 로고    scopus 로고
    • Simulation and reliability study of Cu/low-k devices in flip chip packages
    • Stress-Induced Phenomena in Metallization, edited by P.S. Ho, S.P. Baker, T. Nakamura and C.A. Volkert
    • th International Workshop, edited by P.S. Ho, S.P. Baker, T. Nakamura and C.A. Volkert, pp 52-61.
    • th International Workshop , pp. 52-61
    • Zhao, J.H.1    Wilkerson, B.2    Uehling, T.3
  • 5
    • 0034828968 scopus 로고    scopus 로고
    • Interfacial adhesion study for Cu/SiLK interconnects in flip-chip packages
    • P. S. Ho and M. R. Miller, "Interfacial adhesion study for Cu/SiLK interconnects in flip-chip packages," in Proc. 51st Electron. Comp. Technol. Conf., 2001, pp. 965-970.
    • (2001) Proc. 51st Electron. Comp. Technol. Conf. , pp. 965-970
    • Ho, P.S.1    Miller, M.R.2
  • 6
    • 10444263716 scopus 로고    scopus 로고
    • Underfill characterization for low-k dielectric / Cu interconnect IC flip-chip package reliability
    • pp ?
    • P.H. Tsao, C. Huang, M.J. Li, B. Su and N. Tsai "Underfill Characterization for Low-k Dielectric / Cu Interconnect IC Flip-chip Package Reliability" Proc. 54th Electron. Comp. Technol. Conf., 2004, pp ?
    • (2004) Proc. 54th Electron. Comp. Technol. Conf.
    • Tsao, P.H.1    Huang, C.2    Li, M.J.3    Su, B.4    Tsai, N.5
  • 7
    • 84932162042 scopus 로고    scopus 로고
    • Comprehensive reliability evaluation of a 90nm CMOS technology with Cu/PECVD low-k BeoL
    • pp ?
    • D. Edelstein, H. Rathore et al, "Comprehensive Reliability Evaluation of a 90nm CMOS Technology with Cu/PECVD Low-k BeoL", IEEE International Reliability Physics Symposium, 2004, pp ?
    • (2004) IEEE International Reliability Physics Symposium
    • Edelstein, D.1    Rathore, H.2
  • 8
  • 12
    • 71149121504 scopus 로고
    • Mixed mode cracking in layered materials
    • NewYork: Academic
    • J. W. Hutchinson and Z. Suo, "Mixed mode cracking in layered materials," in Advances in Applied Mechanics. NewYork: Academic, 1991, vol. 29
    • (1991) Advances in Applied Mechanics , vol.29
    • Hutchinson, J.W.1    Suo, Z.2
  • 13
    • 84877079187 scopus 로고    scopus 로고
    • Multilevel fracture mechanics modeling of Cu/Low-k BEoL delamination in flip chip electronic packages
    • To be published in the, Scottdale, AZ
    • C.J. Zhai, et al, "Multilevel Fracture Mechanics Modeling of Cu/Low-k BEoL Delamination in Flip Chip Electronic Packages", To be published in the Proceedings of Cu/low-k Packaging Workshop, 2006, Scottdale, AZ
    • (2006) Proceedings of Cu/low-k Packaging Workshop
    • Zhai, C.J.1
  • 14
    • 2342512828 scopus 로고    scopus 로고
    • Investigation and minimization of underfill delamination in flip chip packages
    • C.J. Zhai, Sidharth, R. Blish and R. N. Master, "Investigation and Minimization of Underfill Delamination in Flip Chip Packages", IEEE Trans Device Materials Reliability, V4, No. 1, 2004, pp 86-91
    • (2004) IEEE Trans Device Materials Reliability , vol.4 , Issue.1 , pp. 86-91
    • Zhai, C.J.1    Sidharth2    Blish, R.3    Master, R.N.4
  • 15
    • 33845592223 scopus 로고    scopus 로고
    • Impact of underfill fillet geometry on interfacial delamination in organic flip chip
    • San Diego, CA
    • K. Kacker, Sidharth, A. Dubey, C.J. Zhai, R.C. Blish, "Impact of Underfill Fillet Geometry on Interfacial Delamination in Organic Flip Chip", in Proc. ECTC 2006, San Diego, CA
    • Proc. ECTC 2006
    • Kacker, K.1    Sidharth2    Dubey, A.3    Zhai, C.J.4    Blish, R.C.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.