The status of 157nm lithography development

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 573-581

  Dean, Kim R ^a   Van Peski, Chris ^a   Kim, Hyeong Soo ^a   Hien, Stefan ^a   Owe Yang, D C ^b   Conley, Will ^a  

^a International SEMATECH   (United States)

^b International SEMIATECH ^*

Author keywords

157nm; 157nm lithography; 157nm resist; ARC; Contamination; Mask; Outgassing; Pellicle; Reticle

Indexed keywords

COPOLYMER; SILICON;

ARTICLE; LITHOGRAPHY; MATERIALS; OPTICS; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY; TECHNOLOGY; THICKNESS;

EID: 0035746902     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.573     Document Type: Article

References (17)