Pattern collapse in high aspect ratio DUV- and 193 nm resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Domke, Wolf D ^a   Graffenberg, Victoria L ^a   Patel, Shashikant ^a   Rich, Georgia K ^a   Cao, Heidi B ^a   Nealey, Paul F ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; PLASTIC COATINGS; PLASTIC FILMS; POLYOLEFINS; SURFACE ACTIVE AGENTS; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) RESISTS;

PHOTORESISTS;

EID: 0033701824     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)