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Journal of the Electrochemical Society

Volumn 154, Issue 1, 2007, Pages

Anion effects on Cu-benzotriazole film formation

(5) Stewart, Karen L a Zhang, Jian b Li, Shoutian b Carter, Phillip W b Gewirth, Andrew A a,c

a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

b CABOT MICROELECTRONICS CORPORATION (United States)

c ELECTROCHEMICAL SOCIETY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENZOTRIAZOLE; FILM FORMATION; REMOVAL RATE;

ATOMIC FORCE MICROSCOPY; CHEMICAL MECHANICAL POLISHING; COPPER; ELLIPSOMETRY; FILM GROWTH; NEGATIVE IONS;

METALLIC FILMS;

EID: 33845261163 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.2393013 Document Type: Article

Times cited : (41)

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