Chemical mechanical planarization of copper: Role of oxidants and inhibitors

Journal of the Electrochemical Society

Volumn 151, Issue 11, 2004, Pages

  Deshpande, S ^a   Kuiry, S C ^a   Klimov, M ^a   Obeng, Y ^b   Seal, S ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b psiloQuest Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEXATION; COPPER; ELECTROCHEMISTRY; HYDROGEN PEROXIDE; REACTION KINETICS; X RAY PHOTOELECTRON SPECTROSCOPY;

CU-GLYCINE COMPLEX; INHIBITORS; MECHANICAL PLANARIZATION; OXIDANTS;

OXIDATION;

EID: 10944221364     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1806395     Document Type: Article

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