Porosity effects on properties of mesoporous silica low- k films prepared using tetraethylorthosilicate with different templates

Journal of the Electrochemical Society

Volumn 154, Issue 1, 2007, Pages

  Ting, Chih Yuan ^a   Sheu, Hwo Shuenn ^b   Wu, Wen Fa ^c,d   Wan, Ben Zu ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^c NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDS; ELECTRIC POTENTIAL; LEAKAGE CURRENTS; MESOPOROUS MATERIALS; POLYETHYLENE GLYCOLS; POROSITY; SILICA; SURFACE ACTIVE AGENTS;

CETYLTRIMETHYLAMMONIUM BROMIDE; DIELECTRIC CONSTANTS; MESOPOROUS SILICA FILMS; TETRAETHYLORTHOSILICATE COLLOID SOLUTIONS;

DIELECTRIC FILMS;

EID: 33845238244     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2388852     Document Type: Article

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