Preparation of ultralow dielectric-constant porous silica films using tween 80 as a template

Journal of the Electrochemical Society

Volumn 150, Issue 8, 2003, Pages

  Ting, Chih Yuan ^a   Ouyan, De Fa ^a   Wan, Ben Zu ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC FIELDS; ETHANOL; HYDROCHLORIC ACID; LEAKAGE CURRENTS; PERMITTIVITY; SILICA; SPIN COATING; SURFACE ACTIVE AGENTS; SURFACE ROUGHNESS; WATER;

HEXAMETHYLDISILAZANE; NONIONIC SURFACTANT; POLYOXYETHYLENE SORBITAN MONOOLEATE; POROUS SILICA FILM; SURFACTANT TEMPLATING PROCESS;

DIELECTRIC FILMS;

EID: 0043210522     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1592521     Document Type: Article

References (10)

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