Low dielectric constant silica films prepared by a templating method

Journal of the Chinese Institute of Chemical Engineers

Volumn 34, Issue 2, 2003, Pages 211-217

  Ting, Chih Yuan ^a   Wu, Chen An ^a   Wan, Ben Zu ^a   Wu, Wen Fa ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

Dielectric constant; Low k materials; Porous silica; Sol gel; Spin coating; Thin film

Indexed keywords

CALCINATION; DIELECTRIC FILMS; POROSITY; SOL-GELS; SOLUTIONS; SPIN COATING; SURFACE ACTIVE AGENTS;

TEMPLATING METHOD;

SILICA;

FILM;

EID: 0037670145     PISSN: 03681653     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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