Electrical and mechanical properties of surfactant-templated mesoporous silica thin films using Brij-76 surfactant

Applied Surface Science

Volumn 244, Issue 1-4, 2005, Pages 47-50

  Jung, Sang Bae ^a   Han, Choo Kyung ^a   Park, Hyung Ho ^a  

^a Yonsei University   (South Korea)

Author keywords

Brij 76; Low k; Mesoporous silica films; Ordered; Surfactant

Indexed keywords

BLOCK COPOLYMERS; DIELECTRIC MATERIALS; DIFFRACTOMETERS; ELASTIC MODULI; ELECTRIC RESISTANCE; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; POROSITY; REFLECTION; SILICA; SURFACE ACTIVE AGENTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

BRIJ-76; LOW-K; MESOPOROUS SILICA FILMS; ORDERED; PORE STRUCTURES; X-RAY REFLECTIVITY;

MESOPOROUS MATERIALS;

EID: 15844429003     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.09.127     Document Type: Conference Paper

References (11)

1. S.K. Chiang, and C.L. Lassen Solid State Technol. 10 1999 42
2. C.J. Brinker, Y. Lu, A. Sellinger, and H. Fan Adv. Mater. 11 1999 579
3. C.J. Brinker, and G.W. Scherer Sol-Gel Science 2nd ed. 1990 Academic Press San Diego p. 213
4. M. Tolan X-ray Scattering from Soft-matter Thin Films 1st ed. 1999 Springer Tokyo p. 6
5. T.M. Parrill J. Mater. Res. 7 1992 2230
6. P. Innocenzi, P. Falcaro, D. Grosso, and F. Babonneau J. Phys. Chem. B 107 2003 4711
7. R.M. Almeida, and C.G. Pantano J. Appl. Phys. 68 1990 4225
8. Y. Sakamoto, I. Díaz, O. Terasaki, D. Zhao, J.P. Pariente, J.M. Kim, and G.D. Stucky J. Phys. Chem. B 106 2002 3118
9. D.A.G. Bruggeman Ann. Phys. 24 1935 636
10. C.Y. Ting, D.F. Ouyan, and B.Z. Wan J. Electrochem. Soc. 150 2003 F164
11. H. Fan, H.R. Bentley, K.R. Kathan, P. Clem, Y. Lu, and C.J. Brinker J. Non-Cryst. Solids 285 2001 79