Backside etching of fused silica with Nd:YAG laser

Applied Surface Science

Volumn 253, Issue 5, 2006, Pages 2796-2800

  Zimmer, K ^a   Bohme R ^a   Pissadakis, S ^b   Hartwig, L ^c   Reisse, G ^c   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^c UNIVERSITY OF APPLIED SCIENCES MITTWEIDA   (Germany)

Author keywords

Etching; Fused silica; Gallium; Laser; Material processing; Nd:YAG

Indexed keywords

ETCHING; GALLIUM; INTERFACES (MATERIALS); LASER BEAM EFFECTS; NEODYMIUM LASERS; REFLECTION; SURFACE TOPOGRAPHY;

BACKSIDE ETCHING; LASER RADIATION; MATERIAL PROCESSING;

FUSED SILICA;

EID: 33751425516     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.05.059     Document Type: Article

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