Studies of the temporal behaviour of a pulsed magnetron deposition discharge

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 630-633

  Welzel, Th ^a   Dunger, Th ^a   Welzel, St ^a   Kupfer, H ^a   Richter, F ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Langmuir probe; Magnetron sputtering; Optical emission spectroscopy; Pulsed plasmas

Indexed keywords

CARRIER CONCENTRATION; DEPOSITION; EMISSION SPECTROSCOPY; PLASMA DENSITY; PLASMA PROBES; PLASMAS;

LANGMUIR PROBE; OPTICAL EMISSION SPECTROSCOPY; PULSED MAGNETRON DEPOSITION DISCHARGE; PULSED PLASMAS;

MAGNETRON SPUTTERING;

DEPOSITION;

EID: 24644431968     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.041     Document Type: Article

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