Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge: Influence of pressure

Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1676-1682

  Dunger, Thoralf ^a   Welzel, Th ^a   Welzel, St ^a,b   Richter, F ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b Inst of Low Temp Plasma Physics   (Germany)

Author keywords

Magnetron; Plasma diagnostics; Pulsed; Reactive sputtering; Time resolved

Indexed keywords

CARRIER CONCENTRATION; CHARGE CARRIERS; OPTICAL VARIABLES MEASUREMENT; PLASMA DIAGNOSTICS; PRESSURE EFFECTS; SPECTROSCOPY;

OPTICAL EMISSION SPECTROSCOPY; REACTIVE SPUTTERING; TIME RESOLVED LANGMUIR DOUBLE PROBE MEASUREMENTS;

MAGNETRON SPUTTERING;

COATING;

EID: 28944452312     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.084     Document Type: Article

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