Deposition and characteristics of iron-silicon thin film catalyst for CNT growth

Diamond and Related Materials

Volumn 15, Issue 11-12 SPEC. ISS., 2006, Pages 1834-1838

  Ting, Jyh Ming ^a   Hung, Shih Wei ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Catalyst; CNT; Fe Si

Indexed keywords

AMORPHOUS SILICON; CATALYST ACTIVITY; IRON ALLOYS; PARTICLE SIZE ANALYSIS; SPUTTER DEPOSITION; THIN FILMS;

CO-SPUTTER DEPOSITION; FE-SI THIN FILM; GROWTH RATE; HYDROGEN PLASMA;

CARBON NANOTUBES;

EID: 33751162619     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.07.017     Document Type: Article

References (38)

1. Emmenegger C., et al. Carbon 41 (2003) 539
2. Cassel A.M., Raymakers J.A., Kong J., et al. J. Phys. Chem., B 103 (1999) 6484
3. Chen P., Zhang H.B., Lin G.D., et al. Carbon 35 (1997) 1495
4. Dai H.J., Rinzier A.G., Nikolaev P., et al. Chem. Phys. Lett. 260 (1996) 471
5. Thess A., Lee R., Nikolaev P., et al. Science 273 (1996) 483
6. Hernadi K., Fonseca A., Nagy J.B., et al. Appl. Catal., A Gen. 199 (2000) 245
7. Kitiyanan B., Alvarez W.E., Harwell J.H., et al. Chem. Phys. Lett. 317 (2000) 497
8. Jonrnet C., Maser W.K., Bernier P., et al. Nature 388 (1997) 756
9. Hou P.-X. Carbon 41 13 (2003) 2477
10. Wang X. Scr. Mater. 44 8-9 (2001) 1567
11. Fan Y.Y., Li F., Cheng H.M., et al. J. Mater. Res. 113 (1998) 2342
12. Lee C.J., et al. Chem. Phys. Lett. 327 (2000) 277
13. Kichambare P.D., et al. Carbon 40 (2002) 1903
14. Ting J.-M., and Liao K.-H. Chem. Phys. Lett. 396 (2004) 469
15. Batalov R.I., Bayazitov R.M., Khaibullin I.B., Terukov E.I., and Kudoyarova V.Kh. Nanotechnology 12 (2001) 409
16. Terai Y., et al. Optical Materials 27 5 (February 2005) 925 (Si-Based Photonics: Towards True Monolithic Integration)
17. Atanassov A., et al. Vacuum 76 2-3 (Nov 5, 2004) 277 (13th International School on Vacuum, Electron and Ion Technology)
18. Liu Z., Okoshi M., et al. J. Vac. Sci. Technol., A 17 (1999) 619
19. Zhao J.-H., et al. Chin. Phys. Lett. 16 (1999) 208
20. Fanciulli M., et al. Phys. Rev., B 59 5 (1999) 3675
21. Murakami Y., et al. Thin Solid Films 461 (2004) 68
22. Nikolaeva M., et al. Vacuum 69 (2003) 221
23. Akiyama K., et al. J. Cryst. Growth 237-239 (2002) 1951
24. Tassis D.H., et al. Thin Solid Films 310 (1997) 115
25. Milosavljevic M., Shao G., Bilic N., Mckinty C.N., Jeynes C., and Homewood K.P. Appl. Phys. Lett. 79 (2001) 1438
26. Vacuum 74 (2004) 653
27. Berling D., et al. J. Magn. Magn. Mater. 212 (2000) 323
28. Appl. Surf. Sci. 91 (1995) 93
29. J. Magn. Magn. Mater. 62 (1986) 215
30. J. Appl. Phys. 71 5 (1 March 1992)
31. Shimada Y., and Kojima H. J. Appl. Phys. 47 9 (1976) 4156
32. Fanciulli M., et al. Phys. Rev., B 59 5 (1999) 3675
33. Milton Ohring, "Materials Science of Thin Films Second Edition" (2002) p176.
34. Drüsedau T.P., et al. Surf. Coat. Technol. 153 (2002) 155
35. Mitsuharu Konuma, "Film Deposition by Plasma Techniques" (1992) p130.
36. Wuhrer R., and Yeung W.Y. J. Mater. Sci. 37 (2002) 3477
37. Ruther R., et al. Thin Solid Films 271 1-2 (Dec 15 1995) 151
38. Lee P.A., et al. Surf. Interface Anal. 17 1 (Jan 1991) 48