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Volumn 310, Issue 1-2, 1997, Pages 115-122

Influence of conventional furnace and rapid thermal annealing on the quality of polycrystalline β-FeSi2 thin films grown from vapor-deposited Fe/Si multilayers

(10) Tassis, D H a Dimitriadis, C A a Boultadakis, S a Arvanitidis, J a Ves, S a Kokkou, S a Logothetidis, S a Valassiades, O a Poulopoulos, P a Flevaris, N K a

a ARISTOTLE UNIVERSITY OF THESSALONIKI (Greece)

Author keywords

Optical properties; Suicides; X ray diffraction

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE EFFECTS; IRON COMPOUNDS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SUBSTRATES; THIN FILMS;

ELECTRON BEAM EVAPORATION;

SEMICONDUCTING FILMS;

EID: 0031275997 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00373-8 Document Type: Article

Times cited : (11)

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