Solid-phase crystallization of β-FeSi2 thin film in Fe/Si structure

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 68-71

  Murakami, Y ^a   Kenjo, A ^a   Sadoh, T ^a   Yoshitake, T ^a   Miyao, M ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

FeSi2; Crystal orientation; Lattice mismatch; Semiconducting silicide; Silicidation

Indexed keywords

CRYSTAL ORIENTATION; IRON COMPOUNDS; SEMICONDUCTING SILICON; SILICON COMPOUNDS; SUBSTRATES; THICKNESS CONTROL; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LATTICE MISMATCH; SEMICONDUCTING SILICIDE; SILICIDATION; SOLID-PHASE;

CRYSTALLIZATION;

EID: 2942685484     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.065     Document Type: Conference Paper

References (6)

1. Reeson K.J., Sharpe J., Harry M., Leong D., McKinty C., Kewell A., Lourenco M., Chen Y.L., Shao G., Homewood K.P. Microelectron. Eng. 50:2000;223.
2. Clevenger L.A., Mann R.W. Maex K.M., van Rossum M. Properties of Metal Silicide. 1995;61 INSPEC, London.
3. Lange H. Phys. Status Solidi. 201:1997;3.
4. Yu P.Y., Cardona M. Fundamentals of Semiconductors. 1996;Springer, Berlin.
5. Ozvold M. Thin Solid Films. 263:1995;92.
6. Moss T.S., Hawkins T.D.F. Infrared Phys. 1:1961;111.