Impurity solubility and redistribution due to recrystallization of preamorphized silicon

Materials Research Society Symposium Proceedings

Volumn 912, Issue , 2006, Pages 119-130

  Duffy, Ray ^a   Venezia, Vincent ^b   Hopstaken, Marco ^c   Maas, Geert ^a   Dao, Thuy ^a   Tamminga, Yde ^a   Roozeboom, Fred ^a   Van Der Tak, Karel ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b AXCELIS TECHNOLOGIES   (United States)

^c NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; CRYSTALLIZATION; EPITAXIAL GROWTH; ION IMPLANTATION; LASER APPLICATIONS; SOLUBILITY;

LASER ANNEALING; METASTABLE SOLUBILITY; PREAMORPHIZATION; SOLID-PHASE-EPITAXIAL-REGROWTH (SPER);

AMORPHOUS SILICON;

EID: 33751030855     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0912-c04-01     Document Type: Conference Paper

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