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Volumn 82, Issue 20, 2003, Pages 3469-3471

Fluorine-enhanced boron diffusion in amorphous silicon

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; AMORPHOUS SILICON; BORON; DIFFUSION; FLUORINE;

EID: 0038319082     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1576508     Document Type: Article
Times cited : (40)

References (13)
  • 1
    • 0003495113 scopus 로고    scopus 로고
    • Ion Implantation Technology Co., New York, 2000
    • Ion Implantation Science and Technology, 2000 ed., edited by J. F. Ziegler (Ion Implantation Technology Co., New York, 2000), pp. 283-291.
    • (2000) Ion Implantation Science and Technology , pp. 283-291
    • Ziegler, J.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.