High performance molecular resists based on β-cyclodextrin

Polymer Journal

Volumn 38, Issue 9, 2006, Pages 996-998

  Kwon, Younggil ^a   Yun, Hyojin ^a   Ganesan, Ramakrishnan ^a   Kim, Jin Baek ^a   Choi, Jae Hak ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Atomic Energy Research Institute   (South Korea)

Author keywords

Cyclodextrin; Lithography; Molecular resist

Indexed keywords

CHEMICAL REACTIONS; EXCIMER LASERS; LITHOGRAPHY; SILICON; SPIN COATING; SYNTHESIS (CHEMICAL); THERMAL EFFECTS;

HEXAMETHYLDISILAZANE-TREATED SILICON WAFER; POSITIVE TONE MOLECULAR RESIST; REACTION MIXTURE;

PROTEINS;

EID: 33750877013     PISSN: 00323896     EISSN: 13490540     Source Type: Journal    
DOI: 10.1295/polymj.PJ2006015     Document Type: Article

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