Encapsulation of light emitting materials and photo-patterning using β-cyclodextrin

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 932-938

  Kim, Jin Baek ^a   Park, Ji Young ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

ArF lithography; Chemically amplified resists; Cyclodextrin; Inclusion; Light emittng; Nanomolecular resists

Indexed keywords

COMPLEXATION; EMISSION SPECTROSCOPY; INCLUSIONS; LIGHT EMISSION; MOLECULAR WEIGHT; OLIGOMERS; PHOTOLITHOGRAPHY; REACTION KINETICS;

ARF LITHOGRAPHY; CHEMICALLY AMPLIFIED RESISTS; CYCLODEXTRIN; LIGHT-EMITTING; NANOMOLECULAR RESISTS;

OPTICAL MATERIALS;

EID: 24644504711     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600269     Document Type: Conference Paper

References (5)

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5. B. S. Wildi, S. W. Taylor, H. A. Potratz, J. Am. Chem. Soc., 73, 1965 (1951).