Negative nanomolecular resists based on calix[4]resocinarene

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Oh, Tae Hwan ^a   Ganesan, Ramakrishnan ^a   Yoon, Je Moon ^a   Kim, Jin Baek ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Calix 4 resocinanrene; Chemically amplified photoresist; DUV lithography; Nanomolecular resists

Indexed keywords

EPOXY RESINS; PHOTOLITHOGRAPHY; SILICON WAFERS; SPIN COATING; THIN FILMS; ULTRAVIOLET RADIATION;

CALIX[4]RESOCINANRENE; CHEMICALLY AMPLIFIED PHOTORESIST; DUV LITHOGRAPHY; NANOMOLECULAR RESISTS;

PHOTORESISTS;

EID: 33745597384     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.660111     Document Type: Conference Paper

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