〈1 0 0〉 bar corner compensation for CMOS compatible anisotropic TMAH etching

Journal of Micromechanics and Microengineering

Volumn 16, Issue 11, 2006, Pages 2458-2462

  Mukhiya, R ^a   Bagolini, A ^b   Margesin, B ^b   Zen, M ^b   Kal, S ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b ITC IRST   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ETCHING; MICROMACHINING; MICROSENSORS; MICROSTRUCTURE; TOXICITY;

BAR COMPENSATION STRUCTURES; CORNER COMPENSATION; SILICON ETCHANTS;

CMOS INTEGRATED CIRCUITS;

EID: 33750591271     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/11/029     Document Type: Article

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