Characterization of the anisotropic chemical attack of (h h l) silicon plates in a TMAH 25 wt.% solution: Micromachining and adequacy of the dissolution slowness surface

Sensors and Actuators, A: Physical

Volumn 105, Issue 1, 2003, Pages 62-75

  Tellier, C R ^a   Charbonnieras, A R ^a,b  

^a Centre National de la Recherche Scientifique   (France)

^b Inst Universitaire de Technologie   (France)

Author keywords

Micromachining; Silicon; Simulation; Stereographic analysis; TMAH solution

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; ETCHING; MICROMACHINING; SILICON; SOLUTIONS;

STEREOGRAPHIC ANALYSIS;

CHEMICAL SENSORS;

EID: 0038387386     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(03)00064-5     Document Type: Article

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