Comparison of scanning capacitance microscopy measurements in open and closed loop modes on highly doped silicon monolayers

Solid-State Electronics

Volumn 50, Issue 9-10, 2006, Pages 1479-1482

  Goghero, D ^a   Gautier, B ^a   Descamps, A ^a   Bremond, G ^a   Faucher, M ^b   Mariolle, D ^b   Bertin, F ^b  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^b CEA LETI   (France)

Author keywords

Bevel; Doping profile; Scanning capacitance microscopy; Silicon monolayers

Indexed keywords

EID: 33750286585     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2006.09.001     Document Type: Letter

References (16)

1. Williams C.C., Slinkman J., Hough W.P., and Wickramasinghe H.K. J Vac Sci Technol A 8 (1990) 895-898
2. Malavé A., Oesterschulze E., Kulisch W., Trenkler T., Hantschel T., and Vandervorst W. Diam Rel Mat 8 (1999) 283-287
3. Bussmann E., and Williams C.C. Rev Sci Instrum 75 (2004) 422-425
4. Mc Bride DE, Kopanski JJ, Belzer BJ. Gate oxide formation under mild conditions for SCM. In: Proc of the international conference for characterization and metrology for ULSI technology, Austin (Texas, USA), March 24-28, 2003. p. 657-61.
5. Lim VSW, Yaoyao J, Trigg A. Study of oxide quality for SCM measurements. In: Proc of the international conference for characterization and metrology for ULSI technology, Austin (Texas, USA), March 24-28, 2003. p. 667-71.
6. Tran T., Nxumalo J.N., Li Y., Thomson D.J., Bridges G.E., and Oliver D.R. J Appl Phys 88 (2000) 6752-6757
7. Kobayashi K., Yamada H., and Matsushige K. Appl Phys Lett 81 (2002) 2629-2631
8. Giannazzo F., Goghero D., Raineri V., Mirabella S., and Priolo F. Appl Phys Lett 83 (2003) 2659-2661
9. Giannazzo F., Priolo F., Raineri V., and Privitera V. Appl Phys Lett 76 (2000) 2565-2567
10. Giannazzo F., Raineri V., La Magna A., Mirabella S., Impellizzeri G., Piro A.M., et al. J Appl Phys 97 (2005) 014302
11. Ciampolini L., Ciappa M., Malberti P., and Fichtner W. Solid State Electron 46 (2002) 445-449
12. Ciampolini L., Bertin F., Hartmann J.M., Rochat N., Holliger Ph., Laugier F., et al. Mat Sci Eng B 102 (2003) 113-118
13. Digital Instrument (Veeco Metrology Group), Quadrex Phase Imaging, Support Note No. 322-C; Santa Barbara USA; 2003.
14. Yabuhara H., Ciappa M., and Fichtner W. J Vac Sci Technol B 20 (2002) 783-786
15. Stephenson R., Verhulst A., De Wolf P., Caymax M., and Vandervorst W. Appl Phys Lett 73 (1998) 2597-2599
16. Clarysse T., Eyben P., Duhayon N., Xu M.W., and Vandervorst W. J Vac Sci Technol B 21 (2003) 729-736