Contrast reversal in scanning capacitance microscopy imaging

Applied Physics Letters

Volumn 73, Issue 18, 1998, Pages 2597-2599

  Stephenson, Robert ^a   Verhulst, Anne ^a   De Wolf, Peter ^a   Caymax, Matty ^a   Vandervorst, Wilfried ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COMPUTER SIMULATION; EPITAXIAL GROWTH; MATHEMATICAL MODELS; SCANNING; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

DOPANT DENSITY; FLATBAND VOLTAGE; RESPONSE FUNCTION; SCANNING CAPACITANCE MICROSCOPY; SPREADING RESISTANCE PROFILE;

IMAGING TECHNIQUES;

EID: 0032476437     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122517     Document Type: Article

References (12)

1. C. C. Williams, J. Slinkman, W. P. Hough, and H. K. Wickramasinghe, J. Vac. Sci. Technol. A 8, 895 (1990).
2. V. Ukraintsev, F. R. Potts, R. M. Wallace, L. K. Magel, H. Edwards, and M. C. Chang (preprint).
3. J. McMurray, J. Kim, and C. Williams, J. Vac. Sci. Technol. B 15, 1011 (1997).
4. J. Marchiando, J. Kopanski, and J. Lowney, J. Vac. Sci. Technol. B 16, 463 (1998).
5. V. V. Zavyalov, J. S. McMurray, and C. C. Williams, Proceedings of the 1998 International Conference on Characterization and Metrology for ULSI Technology, Gaithersburg, MD, March 1998 (unpublished).
6. K. Domansky, Y. Leng, C. C. Williams, J. Janata, and D. Petelenz, Appl. Phys. Lett. 63, 1513 (1993).
7. P. Avouris, T. Hertel, and R. Martel, Appl. Phys. Lett. 71, 285 (1997).
8. T. Clarysse, M. Caymax, P. DeWolf, T. Trenkler, W. Vandervorst, J. McMurray, J. Kim, C. Williams, J. Clark, and G. Neubauer, J. Vac. Sci. Technol. B 16, 394 (1998).
9. S. Morita, Y. Fukano, T. Uchihashi, T. Okusako, Y. Sugawara, Y. Yamanishi, and T. Oasa, Jpn. J. Appl. Phys., Part 1 32, 1701 (1993).
10. DESSIS from Integrated Systems Engineering (ISE), Switzerland.
11. Y. Li, J. N. Nxumalo, and D. J. Thomson, J. Vac. Sci. Technol. B 16, 457 (1998).
12. H. Edwards, R. McGlothlin, R. Martin, E. U. M. Gribelyuk, R. Mahaffy, C. Shih, R. List, and V. Ukraintsev, Appl. Phys. Lett. 72, 698 (1998).