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Volumn 12, Issue 5, 2006, Pages 283-291

Compensation zone approach to avoid print-through errors in mask projection stereolithography builds

Author keywords

Accuracy; Printers; Process planning; Production processes

Indexed keywords

COMPUTER AIDED DESIGN; CURING; ERROR ANALYSIS; MATHEMATICAL MODELS; PRINTING; PRODUCTION;

EID: 33750197780     PISSN: 13552546     EISSN: None     Source Type: Journal    
DOI: 10.1108/13552540610707040     Document Type: Article
Times cited : (25)

References (21)
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    • Microstereolithography using liquid crystal display as dynamic mask-generator
    • Bertsch, A., Zissi, S., Jezequel, J., Corbel, S. and Andre, J. (1997), "Microstereolithography using liquid crystal display as dynamic mask-generator", Microsystems Technologies, Vol. 3 No. 2, pp. 42-7.
    • (1997) Microsystems Technologies , vol.3 , Issue.2 , pp. 42-47
    • Bertsch, A.1    Zissi, S.2    Jezequel, J.3    Corbel, S.4    Andre, J.5
  • 8
    • 0038346507 scopus 로고    scopus 로고
    • Stereolithography on silicon for microfluidics and microsensor packaging
    • Tse, L., Hesketh, P., Rosen, D. and Gole, J. (2003), " Stereolithography on silicon for microfluidics and microsensor packaging", Microsystem Technologies, Vol. 9, pp. 319-23.
    • (2003) Microsystem Technologies , vol.9 , pp. 319-323
    • Tse, L.1    Hesketh, P.2    Rosen, D.3    Gole, J.4
  • 9
    • 0033537535 scopus 로고    scopus 로고
    • 3D microfabrication by combining microstereolithography and thick resist UV lithography
    • Bertsch, A., Lorenz, H. and Renaud, P. (1999), "3D microfabrication by combining microstereolithography and thick resist UV lithography", Sensors and Actuators, Vol. 73 No. 1, pp. 14-23.
    • (1999) Sensors and Actuators , vol.73 , Issue.1 , pp. 14-23
    • Bertsch, A.1    Lorenz, H.2    Renaud, P.3
  • 11
    • 0032505928 scopus 로고    scopus 로고
    • UV microstereolithography system that uses spatial light modulator technology
    • Chatwin, C., Farsari, M., Huang, S., Heywood, M., Birch, P., Young, R. and Richardson, J. (1998), "UV microstereolithography system that uses spatial light modulator technology", Applied Optics, Vol. 37 No. 32, pp. 7514-22.
    • (1998) Applied Optics , vol.37 , Issue.32 , pp. 7514-7522
    • Chatwin, C.1    Farsari, M.2    Huang, S.3    Heywood, M.4    Birch, P.5    Young, R.6    Richardson, J.7
  • 13
    • 0038395990 scopus 로고    scopus 로고
    • Emerging digital micromirror device (DMD) applications
    • Dudley, D., Duncan, W. and Slaughter, J. (2003), "Emerging digital micromirror device (DMD) applications", SPIE Proceedings, Vol. 4985, pp. 14-25.
    • (2003) SPIE Proceedings , vol.4985 , pp. 14-25
    • Dudley, D.1    Duncan, W.2    Slaughter, J.3
  • 20
    • 0032665199 scopus 로고    scopus 로고
    • Microstereolithography using dynamic mask generator and a non-coherent visible light source
    • Monneret, S., Loubere, V. and Corbel, S. (1999), " Microstereolithography using dynamic mask generator and a non-coherent visible light source", Proceedings of SPIE, Vol. 3680, pp. 553-61.
    • (1999) Proceedings of SPIE , vol.3680 , pp. 553-561
    • Monneret, S.1    Loubere, V.2    Corbel, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.