Characterization of epoxy resins for microstereolithographic rapid prototyping

International Journal of Advanced Manufacturing Technology

Volumn 15, Issue 4, 1999, Pages 281-286

  Chatwin, C R ^a   Farsari, M ^a   Huang, S ^a   Heywood, M I ^a   Young, R C D ^a   Birch, P M ^a   Claret Tournier, F ^a   Richardson, J D ^a  

^a UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DIFFRACTIVE OPTICS; EPOXY RESINS; FOUR WAVE MIXING; HOLOGRAPHIC OPTICAL ELEMENTS; INTEGRATED OPTOELECTRONICS; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; PROCESS ENGINEERING; RAPID PROTOTYPING;

HOLOGRAPHIC GRATINGS; MICROSTEREOLITHOGRAPHY;

COMPUTER AIDED MANUFACTURING;

EID: 0032623768     PISSN: 02683768     EISSN: None     Source Type: Journal    
DOI: 10.1007/s001700050067     Document Type: Article

References (12)

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