UV microstereolithography system that uses spatial light modulator technology

Applied Optics

Volumn 37, Issue 32, 1998, Pages 7514-7522

  Chatwin, Chris ^a   Farsari, Maria ^a   Huang, Shiping ^a   Heywood, Malcolm ^a   Birch, Philip ^a   Young, Rupert ^a   Richardson, John ^a  

^a UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; FOUR WAVE MIXING; LENSES; LIGHT MODULATORS; LIGHT SOURCES; OPTICAL SHUTTERS; OPTICS; THREE DIMENSIONAL;

BEAM CONDITIONING OPTICS; MICROSTEREOLITHOGRAPHY; SPATIAL LIGHT MODULATOR;

PHOTOLITHOGRAPHY;

EID: 0032505928     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.007514     Document Type: Article

References (8)

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