Novel high-accuracy microstereolithography method employing an adaptive electro-optic mask

Journal of Materials Processing Technology

Volumn 107, Issue 1-3, 2000, Pages 167-172

  Farsari, M ^a   Claret Tournier, F ^a   Huang, S ^a   Chatwin, C R ^a   Budgett, D M ^a   Birch, P M ^a   Young, R C D ^a   Richardson, J D ^a  

^a UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; DIFFRACTIVE OPTICS; LASERS; LENSES; LIGHT MODULATION; MASKS; OPTICAL SHUTTERS; RAPID PROTOTYPING; ULTRAVIOLET RADIATION;

ADAPTIVE ELECTROOPTIC MASK; MICROSTEREOLITHOGRAPHY; RESIN BATH; SUPER VIDEO GRAPHICS ARRAY; ULTRABIOLET LASER LIGHT SOURCE;

PHOTOLITHOGRAPHY;

EID: 0034318164     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(00)00672-5     Document Type: Article

References (4)

1. Bertsch A., Jézéquel J.Y., André J.C. Study of the spatial resolution of a new 3D micro-fabrication process: the microstereophotolithography using a dynamic mask-generator technique. J. Photochem. Photobiol. A. 107(1-3):1997;275-281.
2. Pottenger M., Eyre B., Kruglick E., Lin G. MEMS: the maturing of a new technology. Solid State Technol. 40(9):1997;89-95.
3. Farsari M., Huang S., Young R.C.D., Heywood M.I., Morrell P.J.B., Chatwin C.R. Holographic characterisation of epoxy resins at 351.1 nm. Opt. Eng. 37(10):1998;2754-2759.
4. P.F. Jacobs, Rapid Prototyping and Manufacturing: Fundamentals of Stereolithography, The Society of Manufacturing Engineers, Dearborn, MI, 1992 (ISBN 0-87263-425-6).