Microstereolithography using a dynamic mask generator and a non-coherent visible light source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3680, Issue I, 1999, Pages 553-561

  Monneret, Serge ^a   Loubere, Virginie ^a   Corbel, Serge ^a  

^a UNIVERSITÉ DE LORRAINE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; FABRICATION; LASER APPLICATIONS; LIQUID CRYSTAL DISPLAYS; MASKS; PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; SPECKLE;

MICROFABRICATION; MICROSTEREOLITHOGRAPHY; PHOTOPOLYMERS;

MICROELECTROMECHANICAL DEVICES;

EID: 0032665199     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (26)