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Volumn , Issue , 2005, Pages 441-447

Process planning method for curing accurate microparts using mask projection micro stereolithography

Author keywords

[No Author keywords available]

Indexed keywords

3-D MEMS; ADDITIVE MANUFACTURING PROCESS; MASK PROJECTION; MICRO PART; MULTI-LAYERED; SIMPLE GEOMETRIES; SINGLE LAYER; TEST LAYERS; VERTICAL DIMENSIONS;

EID: 78649883276     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (8)

References (18)
  • 2
    • 0002358952 scopus 로고    scopus 로고
    • Microstereolithography using liquid crystal display as dynamic mask-generator
    • Bertsch, A., Zissi, S., Jezequel, J., Corbel, S., Andre, J. 1997. Microstereolithography using liquid crystal display as dynamic mask-generator. Microsystems Technologies 3(2): 42-47.
    • (1997) Microsystems Technologies , vol.3 , Issue.2 , pp. 42-47
    • Bertsch, A.1    Zissi, S.2    Jezequel, J.3    Corbel, S.4    Andre, J.5
  • 3
    • 0033537535 scopus 로고    scopus 로고
    • 3D microfabrication by combining microstereolithography and thick resist UV lithography
    • Bertsch, A., Lorenz, H., Renaud, P. 1999. 3D microfabrication by combining microstereolithography and thick resist UV lithography. Sensors and Actuators 73(1): 14-23.
    • (1999) Sensors and Actuators , vol.73 , Issue.1 , pp. 14-23
    • Bertsch, A.1    Lorenz, H.2    Renaud, P.3
  • 6
    • 0032505928 scopus 로고    scopus 로고
    • UV microstereolithography system that uses spatial light modulator technology
    • Chatwin, C., Farsari, M., Huang, S., Heywood, M., Birch, P., Young, R., Richardson, J. 1998. UV microstereolithography system that uses spatial light modulator technology. Applied Optics 37(32): 7514-22. (Pubitemid 128658873)
    • (1998) Applied Optics , vol.37 , Issue.32 , pp. 7514-7522
    • Chatwin, C.1
  • 8
    • 0038395990 scopus 로고    scopus 로고
    • Emerging Digital Micromirror Device (DMD) applications
    • Dudley, D., Duncan, W., Slaughter, J. 2003. Emerging Digital Micromirror Device (DMD) applications SPIE proceedings 4985: 14-25.
    • (2003) SPIE Proceedings , vol.4985 , pp. 14-25
    • Dudley, D.1    Duncan, W.2    Slaughter, J.3
  • 16
    • 0032665199 scopus 로고    scopus 로고
    • Microstereolithography using dynamic mask generator and a non-coherent visible light source
    • Monneret, S., Loubere, V., Corbel, S. 1999. Microstereolithography using dynamic mask generator and a non-coherent visible light source Proc. SPIE 3680: 553-561.
    • (1999) Proc. SPIE , vol.3680 , pp. 553-561
    • Monneret, S.1    Loubere, V.2    Corbel, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.