Investigations of electron injection in a methanofullerene thin film transistor

Journal of Applied Physics

Volumn 100, Issue 7, 2006, Pages

  Von Hauff, Elizabeth ^a   Parisi, Jürgen ^a   Dyakonov, Vladimir ^b  

^a UNIVERSITY OF OLDENBURG   (Germany)

^b UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT RESISTANCES; DIFFUSION LIMITED THERMIONIC EMISSION (DLTE); MATERIAL PARAMETERS; METHANOFULLERENE;

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC FIELDS; ELECTRIC RESISTANCE; ELECTRONS; ESTERS; FULLERENES; PARTICLE BEAM INJECTION; SEMICONDUCTING ORGANIC COMPOUNDS; THERMIONIC EMISSION;

THIN FILM TRANSISTORS;

EID: 33750022315     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2352808     Document Type: Article

References (41)

1. L. Bürgi, T. J. Richards, R. H. Friend, and H. Sirringhaus, J. Appl. Phys. 94, 6129 (2002).
2. B. H. Hamadani and D. Natelson, Appl. Phys. Lett. 84, 443 (2004).
3. W. R. Silveira and J. A. Marohn, Phys. Rev. Lett. 93, 116104 (2004).
4. C. Waldauf, P. Schilinsky, M. Perisutti, J. Hauch, and C. Brabec, Adv. Mater. (Weinheim, Ger.) 15, 2084 (2003).
5. E. J. Meijer, Nat. Mater. 2, 678 (2003).
6. E. von Hauff, J. Parisi, and V. Dyakonov, Thin Solid Films 511, 506 (2006).
7. T. D. Anthopoulos, C. Tanase, S. Setayesh, E. J. Meijer, J. C. Hummelen, P. W. M. Blom, and D. M. de Leeuw, Adv. Mater. (Weinheim, Ger.) 16, 2174 (2004).
8. G. Horowitz, R. Hajlaoui, D. Fichou, and A. E. Kassmi, J. Appl. Phys. 85, 3202 (1999).
9. W. Meyer and H. Neldel, Z. Tech. Phys. (Leipzig) 12, 588 (1937).
10. R. S. Crandall, Phys. Rev. B 43, 4057 (1991).
11. Y. F. Chen and S. F. Huang, Phys. Rev. B 44, 13775 (1991).
12. W. B. Jackson, Phys. Rev. B 38, 3595 (1998).
13. M. Grunewald and P. Thomas, Phys. Status Solidi B 94, 125 (1979).
14. F. R. Shapiro and D. Adler, J. Non-Cryst. Solids 74, 189 (1985).
15. D. Monroe, Phys. Rev. Lett. 54, 146 (1985).
16. J. C. Wang and Y. F. Chen, Appl. Phys. Lett. 73, 948 (1998).
17. A. Hamed, Y. Y. Sun, Y. K. Tao, R. L. Meng, and P. H. Hor, Phys. Rev. B 47, 10873 (1993).
18. E. J. Meijer, M. Matters, P. T. Herwig, D. M. de Leeuw, and T. M. Klapwijk, Appl. Phys. Lett. 76, 3433 (2000).
19. S. Luan and G. W. Neudeck, J. Appl. Phys. 72, 766 (1992).
20. R. A. Street and A. Salleo, Appl. Phys. Lett. 81, 2887 (2002).
21. R. J. Chesterfield, J. C. McKeen, C. R. Newman, C. D. Frisbie, P. C. Ewbank, K. R. Mann, and L. L. Miller, J. Appl. Phys. 95, 6396 (2004).
22. P. V. Necliudov, M. S. Shur, D. J. Grundlach, and T. N. Jackson, J. Appl. Phys. 88, 6594 (2000).
23. K. Seshadri and C. D. Frisbie, Appl. Phys. Lett. 78, 993 (2001).
24. T. Hassenkam, D. R. Greve, and T. Bjornholm, Adv. Mater. (Weinheim, Ger.) 13, 631 (2001).
25. L. Bürgi, H. Sirringhaus, and R. H. Friend, Appl. Phys. Lett. 80, 2913 (2002).
26. V. Podzorov, V. M. Pudalov, and M. E. Gershenson, Appl. Phys. Lett. 82, 1739 (2003).
27. B. H. Hamadani and D. Natelson, J. Appl. Phys. 97, 064508 (2005).
28. J. G. Simmons, Phys. Rev. Lett. 15, 967 (1965).
29. P. R. Emtage and J. J. O'Dwyer, Phys. Rev. Lett. 16, 356 (1965).
30. J. C. Scott and G. G. Malliaras, Chem. Phys. Lett. 299, 115 (1999).
31. V. I. Arkhipov, E. V. Emelianova, Y. H. Tak, and H. Bässler, J. Appl. Phys. 84, 848 (1998).
32. T. van Woudenbergh, P. W. M. Blom, M. C. J. M. Vissenberg, and J. N. Huiberts, Appl. Phys. Lett. 79, 1697 (2001).
33. M. C. J. M. Vissenberg and M. Matters, Phys. Rev. B 57, 12964 (1998).
34. H. Bässler, Phys. Status Solidi B 175, 15 (1993).
35. C. Tanase, E. J. Meijer, P. W. M. Blom, and D. M. de Leeuw, Phys. Rev. Lett. 91, 216601 (2003).
36. G. E. Pike and C. H. Seager, Phys. Rev. B 10, 1421 (1974).
37. E. J. Meijer, C. Tanase, P. W. M. Blom, E. van Veenendaal, B.-H. Huisman, D. M. de Leeuw, and T. M. Klapwijk, Appl. Phys. Lett. 80, 3838 (2002).
38. J. C. Hummelen, B. W. Knight, F. LePeq, F. Wudl, J. Yao, and C. L. Wilkins, J. Org. Chem. 60, 532 (1995).
39. G. Blanchet, C. R. Fincher, and M. Lefenfeld, Appl. Phys. Lett. 84, 296 (2004).
40. V. D. Mihailetchi, Adv. Funct. Mater. 13, 43 (2003).
41. J. K. J. van Duren, V. D. Mihailetchi, P. W. M. Blom, T. van Woudenbergh, J. C. Hummelen, R. A. J. Janssen, and M. M. Wienk, J. Appl. Phys. 94, 4477 (2003).