-
1
-
-
1842658891
-
-
Manyala, N.; Sidis, Y.; Ditusa, J. F.; Aeppli, G.; Young, D. P.; Fisk, Z. Nat. Mater. 2004, 3, 255.
-
(2004)
Nat. Mater.
, vol.3
, pp. 255
-
-
Manyala, N.1
Sidis, Y.2
Ditusa, J.F.3
Aeppli, G.4
Young, D.P.5
Fisk, Z.6
-
2
-
-
2942610744
-
-
Zutic, I.; Fabian, J.; Das Sarma, S. Rev. Mod. Phys. 2004, 76, 323.
-
(2004)
Rev. Mod. Phys.
, vol.76
, pp. 323
-
-
Zutic, I.1
Fabian, J.2
Das Sarma, S.3
-
3
-
-
0009501328
-
-
Ohno, H.; Shen, A.; Matsukura, F.; Oiwa, A.; Endo, A.; Katsumoto, S.; Lye, Y. Appl. Phys. Lett. 1996, 69, 363.
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 363
-
-
Ohno, H.1
Shen, A.2
Matsukura, F.3
Oiwa, A.4
Endo, A.5
Katsumoto, S.6
Lye, Y.7
-
5
-
-
24044486251
-
-
Eriksson, M. A.; Friesen, M.; Coppersmith, S. N.; Joynt, R.; Klein, L. J.; Slinker, K.; Tahan, C.; Mooney, P. M.; Chu, J. O.; Koester, S. J. Quantum Inf. Process. 2004, 3, 133.
-
(2004)
Quantum Inf. Process.
, vol.3
, pp. 133
-
-
Eriksson, M.A.1
Friesen, M.2
Coppersmith, S.N.3
Joynt, R.4
Klein, L.J.5
Slinker, K.6
Tahan, C.7
Mooney, P.M.8
Chu, J.O.9
Koester, S.J.10
-
6
-
-
20444455442
-
-
Choi, H.-J.; Seong, H.-K.; Chang, J.; Lee, K.-I.; Park, Y.-J.; Kim, J.-J.; Lee, S.-K.; He, R.; Kuykendall, T.; Yang, P. Adv. Mater. 2005, 17, 1351.
-
(2005)
Adv. Mater.
, vol.17
, pp. 1351
-
-
Choi, H.-J.1
Seong, H.-K.2
Chang, J.3
Lee, K.-I.4
Park, Y.-J.5
Kim, J.-J.6
Lee, S.-K.7
He, R.8
Kuykendall, T.9
Yang, P.10
-
7
-
-
23144452032
-
-
Radovanovic, P. V.; Barrelet, C. J.; Gradecak, S.; Qian, F.; Lieber, C. M. Nano Lett. 2005, 5, 1407.
-
(2005)
Nano Lett.
, vol.5
, pp. 1407
-
-
Radovanovic, P.V.1
Barrelet, C.J.2
Gradecak, S.3
Qian, F.4
Lieber, C.M.5
-
8
-
-
9644283361
-
-
Samuelson, L.; Thelander C.; Bjoerk, M. T.; Borgstroem, M.; Deppert, K.; Dick, K. A.; Hansen, A. E.; Martensson, T.; Panev, N.; Persson, A. I.; Seifert, W.; Skoeld, N.; Larsson, M. W.; Wallenberg, L. R. Physica E 2004, 25, 313.
-
(2004)
Physica E
, vol.25
, pp. 313
-
-
Samuelson, L.1
Thelander, C.2
Bjoerk, M.T.3
Borgstroem, M.4
Deppert, K.5
Dick, K.A.6
Hansen, A.E.7
Martensson, T.8
Panev, N.9
Persson, A.I.10
Seifert, W.11
Skoeld, N.12
Larsson, M.W.13
Wallenberg, L.R.14
-
9
-
-
0037418379
-
-
Xia, Y.; Yang, P.; Sun, Y.; Wu, Y.; Mayers, B.; Gates, B.; Yin, Y.; Kim, F.; Yan, H. Adv. Mater. 2003, 15, 353.
-
(2003)
Adv. Mater.
, vol.15
, pp. 353
-
-
Xia, Y.1
Yang, P.2
Sun, Y.3
Wu, Y.4
Mayers, B.5
Gates, B.6
Yin, Y.7
Kim, F.8
Yan, H.9
-
12
-
-
33748324757
-
-
Schmitt, A. L.; Bierman, M. J.; Schmeisser, D.; Himpsel, F. J.; Jin, S. Nano Lett. 2006, 6, 1617.
-
(2006)
Nano Lett.
, vol.6
, pp. 1617
-
-
Schmitt, A.L.1
Bierman, M.J.2
Schmeisser, D.3
Himpsel, F.J.4
Jin, S.5
-
15
-
-
4344663116
-
-
Zhang, S. L.; Smith, U. J. Vac. Sci. Technol., A 2004, 22, 1361.
-
(2004)
J. Vac. Sci. Technol., A
, vol.22
, pp. 1361
-
-
Zhang, S.L.1
Smith, U.2
-
17
-
-
28044433204
-
-
Fitz, C.; Goldbach, M.; Dupont, A.; Schmidbauer, S. Microelectron. Eng. 2005, 82, 460.
-
(2005)
Microelectron. Eng.
, vol.82
, pp. 460
-
-
Fitz, C.1
Goldbach, M.2
Dupont, A.3
Schmidbauer, S.4
-
18
-
-
0036121978
-
-
Kamal, A. H. M.; Obeidat, A. T.; Budri, T. J. Vac. Sci. Technol., B 2002, 20, 173.
-
(2002)
J. Vac. Sci. Technol., B
, vol.20
, pp. 173
-
-
Kamal, A.H.M.1
Obeidat, A.T.2
Budri, T.3
-
19
-
-
3142684485
-
-
Wu, Y.; Xiang, J.; Yang, C.; Lu, W.; Lieber, C. M. Nature 2004, 430, 61.
-
(2004)
Nature
, vol.430
, pp. 61
-
-
Wu, Y.1
Xiang, J.2
Yang, C.3
Lu, W.4
Lieber, C.M.5
-
22
-
-
0002589883
-
-
Lazell, M.; O'Brien, P.; Otway, D. J.; Park, J.-H. J. Chem. Soc., Dalton Trans. 2000, 4479.
-
(2000)
J. Chem. Soc., Dalton Trans.
, pp. 4479
-
-
Lazell, M.1
O'Brien, P.2
Otway, D.J.3
Park, J.-H.4
-
23
-
-
33745138199
-
-
Ouyang, L.; Thrall, E. S.; Deshmukh, M. M.; Park, H. Adv. Mater. 2006, 18, 1437.
-
(2006)
Adv. Mater.
, vol.18
, pp. 1437
-
-
Ouyang, L.1
Thrall, E.S.2
Deshmukh, M.M.3
Park, H.4
-
24
-
-
0141757466
-
-
Barrelet, C. J.; Wu, Y.; Bell, D. C.; Lieber, C. M. J. Am. Chem. Soc. 2003, 125, 11498.
-
(2003)
J. Am. Chem. Soc.
, vol.125
, pp. 11498
-
-
Barrelet, C.J.1
Wu, Y.2
Bell, D.C.3
Lieber, C.M.4
-
25
-
-
0039857070
-
-
Novak, I.; Huang, W.; Luo, L.; Huang, H. H.; Ang, H. G.; Zybill, C. E. Organometallics 1997, 16, 1567.
-
(1997)
Organometallics
, vol.16
, pp. 1567
-
-
Novak, I.1
Huang, W.2
Luo, L.3
Huang, H.H.4
Ang, H.G.5
Zybill, C.E.6
-
26
-
-
84906378209
-
-
note
-
3 was removed with dynamic vacuum before sublimation at 40°C and 0.1 Torr was carried out for 2 h. The final product of yellow crystals collected on the coldfinger weighed 3.65 g (a 68% yield). Sublimed crystals were suitable for single-crystal X-ray diffraction study, which revealed identical cell parameters to those previously reported (ref 27); therefore, full crystallographic data collection was not carried out.
-
-
-
-
28
-
-
0033882935
-
-
Prokop, J.; Zybill, C. E.; Veprek, S. Thin Solid Films 2000, 359, 39.
-
(2000)
Thin Solid Films
, vol.359
, pp. 39
-
-
Prokop, J.1
Zybill, C.E.2
Veprek, S.3
-
30
-
-
84906406712
-
-
note
-
2O = 1:1:5 v/v) at 70°C for 20 min and were placed in the hot center zone of the furnace. About 150 mg of the SSP in a small alumina boat was placed 2 cm upstream from the entrance to the furnace at about 100°C, evaporated, and carried downstream by a flow of 100 seem of argon. Optimal nanowire growth was carried out at a furnace set temperature of 750°C and a total pressure of 200 Torr for 20-25 min in which time the SSP was usually consumed.
-
-
-
-
31
-
-
84906363870
-
-
note
-
SEM images were taken with a LEO Supra field-emission electron microscope or a Zeiss Crossbeam microscope. PXRD was collected using a Siemens STOE X-ray diffractometer. HRTEM images were collected using a Philips CM200 UT transmission electron microscope with an accelerating voltage of 200 kV on nanowires that were sonicated and suspended in ethanol, dispersed onto lacey carbon film TEM grids.
-
-
-
-
35
-
-
0035384290
-
-
de Groot, F. Chem. Rev. 2001, 101, 1779.
-
(2001)
Chem. Rev.
, vol.101
, pp. 1779
-
-
Groot, F.1
-
36
-
-
84906406713
-
-
note
-
For device fabrication, CoSi nanowires were first suspended in ethanol via sonication and deposited onto degenerately doped Si(100) coated with 600 nm of thermally grown oxide. Electrodes were then defined using either standard contact photolithography or e-beam lithography. Contacts to nanowires were made using thermally or e-beam deposited 40 nm Au atop 40 nm Ti after a 5 s 5% HF etch. Room-temperature measurements were performed using a Cascade probe station and a home-built transport setup. Low-T measurement was performed on Al wire-bonded device chips using a Quantum Design Physical Property Measurement System (PPMS) and a Keithley 2400 sourcemeter.
-
-
-
-
37
-
-
15544385086
-
-
Ren, W. L.; Li, C. C.; Zhang, L. T.; Ito, K.; Wu, J. S. J. Alloys Compd. 2005, 392, 50.
-
(2005)
J. Alloys Compd.
, vol.392
, pp. 50
-
-
Ren, W.L.1
Li, C.C.2
Zhang, L.T.3
Ito, K.4
Wu, J.S.5
-
38
-
-
0013069974
-
-
Maex, K., Van Rossum, M., Eds.; INSPEC, the Institution of Electrical Engineers: London: U.K.
-
Properties of Metal Suicides; Maex, K., Van Rossum, M., Eds.; INSPEC, the Institution of Electrical Engineers: London: U.K., 1995.
-
(1995)
Properties of Metal Suicides
-
-
-
39
-
-
2642552870
-
-
Jin, S.; Whang, D. M.; McAlpine, M. C.; Friedman, R. S.; Wu, Y.; Lieber, C. M. Nano Lett. 2004, 4, 915.
-
(2004)
Nano Lett.
, vol.4
, pp. 915
-
-
Jin, S.1
Whang, D.M.2
McAlpine, M.C.3
Friedman, R.S.4
Wu, Y.5
Lieber, C.M.6
-
40
-
-
29844437694
-
-
Kuo, Y. K.; Sivakumar, K. M.; Huang, S. J.; Lue, C. S. J. Appl. Phys. 2005, 98, 123510/1.
-
(2005)
J. Appl. Phys.
, vol.98
-
-
Kuo, Y.K.1
Sivakumar, K.M.2
Huang, S.J.3
Lue, C.S.4
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