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Volumn 35, Issue 3, 2006, Pages 177-184

Characterization of reactively evaporated TiO2 thin films as high and medium index layers for optical applications

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PARAMETERS; ELECTRON BEAM HEATING TECHNIQUE; OPTICAL CONSTANTS; SUBSTRATE TEMPERATURE;

EID: 33749587336     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap:2006087     Document Type: Article
Times cited : (41)

References (45)
  • 18
    • 33749594965 scopus 로고
    • US Patent No. 2920 002
    • M.A. Awarter, US Patent No. 2920 002, 1960
    • (1960)
    • Awarter, M.A.1
  • 24
    • 33749645017 scopus 로고    scopus 로고
    • M.H. Asghar, F. Placido, S. Naseem, to be published
    • M.H. Asghar, F. Placido, S. Naseem, to be published
  • 27
    • 0000550480 scopus 로고
    • G. Hass, Vacuum 2, 331 (1952)
    • (1952) Vacuum , vol.2 , pp. 331
    • Hass, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.