Sensing behavior of TiO2 thin films exposed to air at low temperatures

Sensors and Actuators, B: Chemical

Volumn 67, Issue 3, 2000, Pages 282-289

  Rothschild, A ^a   Edelman, F ^a   Komem, Y ^a   Cosandey, F ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISORPTION; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTROCHEMICAL ELECTRODES; GRAIN SIZE AND SHAPE; OXIDATION; REACTION KINETICS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES; SPUTTERING; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

ELOVICH-ROGINSKY CHEMISORPTION KINETICS; SEMICONDUCTOR GAS SENSORS;

CHEMICAL SENSORS;

EID: 0034272628     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(00)00523-2     Document Type: Article

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