Nanopatterning of an organic monolayer covered Si (1 1 1) surfaces by atomic force microscope scratching

Electrochimica Acta

Volumn 51, Issue 18, 2006, Pages 3674-3679

  Zhang, Y ^a   Balaur, E ^a   Schmuki, P ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

AFM; Copper electrodeposition; Copper immersion platting; Nanopatterning; Organic monolayer

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; COPPER DEPOSITS; DIAMONDS; ELECTRODEPOSITION; HYDROGEN; MONOLAYERS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY;

COPPER ELECTRODEPOSITION; IMMERSION PLATING; NANOPATTERNING; ORGANIC MONOLAYERS;

SILICON;

EID: 33748878416     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.10.030     Document Type: Article

References (29)

1. Kumar A., Biebuyck H.A., and Whitesides G.M. Langmuir 10 (1994) 1498
2. Collier C.P., Mattersteig G., Wong E.W., Luo Y., Beverly K., Sampaio J., Raymo F., Stoddart J.F., and Heath J.R. Science 289 (2000) 1172
3. Saito N., Youda S., Hayshi K., Sugimura H., and Takai O. Surf. Sci. 523-535 (2003) 970
4. Gölzhäuser A., Geyer W., Stadler V., Eck W., and Grunze M. J. Vac. Sci. Technol. B 16 (2000) 6
5. Balaur E., Djenizian T., Boukherroub R., Chazalviel J.N., Ozanam F., and Schmuki P. Electrochem. Commun. 6 (2004) 153
6. Bhushan B., and Koinkar V.N. J. Appl. Phys. 75 (1994) 5741
7. Pötzschke R.T., Staikov G., Lorenz W., and Wiesbeck W. J. Electrochem. Soc. 146 (1999) 141
8. Koinuma M., and Uosaki K. Surf. Sci. 357-358 (1996) 565
9. Santinacci L., Djenizian T., and Schmuki P. J. Electrochem. Soc. 148 (2001) C640
10. Schmuki P., and Erickson L.E. Phys. Rev. Lett. 85 (2000) 2985
11. Schmuki P., Erickson L.E., and Lockwood D.J. Phys. Rev. Lett. 80 (1998) 4060
12. Djenizian T., Santinacci L., and Schmuki P. Surf. Sci. 524 (2003) 40
13. Djenizian T., Santinacci L., and Schmuki P. Appl. Phys. Lett. 78 (2001) 2940
14. Sohn L.L., and Willett R.L. Appl. Phys. Lett. 67 (1995) 1552
15. Bouchiat V., and Esteve D. Appl. Phys. Lett. 69 (1996) 3098
16. Zhang Y., Balaur E., Maupai S., Djenizian T., Boukherroub R., and Schmuki P. Electrochem. Commun. 5 (2003) 337
17. Carrey J., Bouzehouane K., Georger J.M., Ceneray C., Bibes B.T.M., Vaures A., Fusil S., Kenane S., Vila L., and Piraux L. Appl. Phys. Lett. 81 (2002) 760
18. Homma T., Kubo N., Kono T., and Osaka T. Electrochim. Acta 48 (2003) 3115
19. Santinacci L., Djenizian T., Hildebrand H., Ecoffey S., Mokdad H., Campanella T., and Schmuki P. Electrochim. Acta 48 (2001) 3123
20. Michler J., Gasilloud R., Gasser P., Santinacci L., and Schmuki P. Electrochem. Solid State Lett. 7 (2004) 41
21. Allongue P., Villeneuve C.H., Morin S., Boukherroub R., and Wayner D.D.M. Electrochim. Acta 45 (2000) 4591
22. Boukherroub R., Bensebaa F., Morin S., and Wayner D.D.M. Langmuir 15 (1999) 3831
23. Linford M.R., Fenter P., Eisenberger P.M., and Chidsey C.E.D. J. Am. Chem. Soc. 117 (1995) 3145
24. Wagner P., Nock S., Spudich J.A., Volkmuth W.D., Chu S., Cicero R.L., Wade C.P., Linford M.R., and Chidsey C.E.D. J. Struct. Biol. 119 (1997) 189
25. Norga G.J., Platero M., Black K.A., Ready A.J., Michel J., and Kimerling L.C. J. Electrochem. Soc. 144 (1997) 2801
26. Lee M.K., Wang J.J., and Wang H.D. J. Electrochem. Soc. 44 (1997) 1777
27. Volmer M., and Weber A. Z. Phys. Chem. 119 (1926) 227
28. Yoneshige K.K., Parks H.G., Raghavan S., Hiskey J.B., and Resnick P.J. Z. Phys. Chem. 142 (1995) 671
29. Santinacci L., Djenizian T., and Schmuki P. Appl. Phys. Lett. 79 (2001) 1982