Nanopatterning of Si(1 1 1) surfaces by atomic force microscope scratching of an organic monolayer

Electrochemistry Communications

Volumn 5, Issue 4, 2003, Pages 337-340

  Zhang, Y ^a   Balaur, E ^a   Maupai, S ^a   Djenizian, T ^a   Boukherroub, R ^b   Schmuki, P ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

Author keywords

AES surface analysis; AFM; Copper electroless deposition; Nanopatterning; Organic monolayer

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTROLYTES; MONOLAYERS; NANOTECHNOLOGY;

NANOPATTERNING;

ELECTROLESS PLATING;

10 UNDECENOIC ACID; COPPER; COPPER SULFATE; ELECTROLYTE; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; MICROSCOPY; NANOPARTICLE; SCANNING ELECTRON MICROSCOPY; STRUCTURE ANALYSIS;

EID: 0038641666     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1388-2481(03)00052-3     Document Type: Article

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