Electron beam-induced modification of organic monolayers on Si(1 1 1) surfaces used for selective electrodeposition

Electrochemistry Communications

Volumn 6, Issue 2, 2004, Pages 153-157

  Balaur, E ^a   Djenizian, T ^a   Boukherroub, R ^b   Chazalviel, J N ^c   Ozanam, F ^c   Schmuki, P ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b INSTITUT D ELECTRONIQUE   (France)

^c LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

Author keywords

AES and XPS surface analysis; Copper electrodeposition; DLC; e Beam lithography; Nanopatterning; Organic monolayer

Indexed keywords

ELECTRODEPOSITION; ELECTRON BEAMS; HYDROGEN; LITHOGRAPHY; MONOLAYERS; SCANNING ELECTRON MICROSCOPY; SILICON;

ELECTROCHEMICAL PARAMETERS; ORGANIC MONOLAYERS;

ELECTROCHEMISTRY;

10 UNDECENOIC ACID; ALKENE DERIVATIVE; COPPER; HYDROGEN; ORGANIC COMPOUND; SILICON;

ARTICLE; COVALENT BOND; ELECTROCHEMISTRY; ELECTRON BEAM; IRRADIATION; SCANNING ELECTRON MICROSCOPY; STEREOCHEMISTRY; SURFACE PROPERTY;

EID: 1042302147     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2003.11.004     Document Type: Article

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