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Volumn 596, Issue 2, 2006, Pages 124-130

Radio frequency magnetron sputtering of Au and low temperature plasma enhanced chemical vapor deposition of silicon nitride for ring ultramicroelectrodes fabrication

(4) Zhu, Mingzhi a,b,c Jiang, Zhuangde a Jing, Weixuan a Yang, Biao a

a XI'AN JIAOTONG UNIVERSITY (China)

b XI'AN JIAOTONG UNIVERSITY (China)

c RESEARCH CENTER OF LASER FUSION (China)

Author keywords

Cyclic voltammetry; Low temperature PECVD; Optical fibers; RF magnetron sputtering; Ring ultramicroelectrodes

Indexed keywords

CYCLIC VOLTAMMETRY; ELECTRODES; MAGNETRON SPUTTERING; NATURAL FREQUENCIES; OPTICAL FIBERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE;

LOW TEMPERATURE PECVD; RF MAGNETRON SPUTTERING; RING ULTRAMICROELECTRODES;

GOLD;

EID: 33748854423 PISSN: 15726657 EISSN: None Source Type: Journal
DOI: 10.1016/j.jelechem.2006.07.030 Document Type: Article

Times cited : (2)

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