CVD of alumina on carbon and silicon carbide microfiber substrates for microelectrode development

Chemical Vapor Deposition

Volumn 8, Issue 3, 2002, Pages 93-98

  Giolando, Dean M ^a   Kirchhoff, Jon R ^a   Mueller, Holger ^a   Nguyen, Phu Q ^a   Odeh, Ihab N ^a  

^a UNIVERSITY OF TOLEDO   (United States)

Author keywords

Alumina; Carbides; Microelectrodes; Microsubstrates; Silicon carbide

Indexed keywords

ALUMINA; CARBON FIBERS; CHEMICAL VAPOR DEPOSITION; METALLIC FILMS; MICROELECTRODES; TEMPERATURE CONTROL; THICKNESS CONTROL;

COATED SUBSTRATES; EPOXY SEALANT; GLASS CAPILLARIES; MICROSUBSTRATES;

SILICON CARBIDE;

EID: 0040669962     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(20020503)8:3<93::AID-CVDE93>3.0.CO;2-B     Document Type: Article

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