Development of disk ultramicroelectrodes based on low melting or softening point metal fibers by low temperature plasma enhanced chemical vapor deposition

Analytica Chimica Acta

Volumn 551, Issue 1-2, 2005, Pages 57-64

  Zhu, Mingzhi ^a,b,c   Jiang, Zhuangde ^a,b   Jing, Weixuan ^a,b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b XI'AN JIAOTONG UNIVERSITY   (China)

^c RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

Au fibers; Disk ultramicroelectrodes; Low temperature PECVD; Silicon nitride thin films

Indexed keywords

ELECTRIC CURRENTS; ELECTROCHEMICAL ELECTRODES; MELTING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SALINITY MEASUREMENT; SURFACES;

DISK ELECTRODES; LOW MELTING; ULTRAMICROELECTRODES;

MICROELECTRODES;

SILICON NITRIDE;

ADHESION; ARTICLE; CYCLIC POTENTIOMETRY; DIFFUSION; ELECTROCHEMISTRY; ELECTRODE; LOW TEMPERATURE; MELTING POINT; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; STEADY STATE; SURFACE PROPERTY; TEMPERATURE MEASUREMENT; VAPORIZATION;

EID: 25844437538     PISSN: 00032670     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.aca.2005.07.011     Document Type: Article

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