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Volumn 507, Issue 2, 2004, Pages 237-245
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Copper ring-disk microelectrodes: Fabrication, characterization, and application as an amperometric detector for capillary columns
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Author keywords
Capillary column detectors; Chemical vapor deposition; Electrode modification; Ring disk microelectrodes
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CYCLIC VOLTAMMETRY;
ETCHING;
OPTICAL MICROSCOPY;
SCANNING ELECTRON MICROSCOPY;
TUNGSTEN;
ELECTRODE MODIFICATION TECHNIQUES;
ELECTROETCHING;
MICROELECTRODES;
COPPER;
HYDROXIDE;
SILICON DIOXIDE;
TUNGSTEN;
AMPEROMETRIC BIOSENSOR;
AQUEOUS SOLUTION;
ARTICLE;
CYCLIC POTENTIOMETRY;
ELECTROPLATING INDUSTRY;
FLOW INJECTION ANALYSIS;
MICROELECTRODE;
MICROSCOPY;
PARTICLE SIZE;
PRIORITY JOURNAL;
SCANNING ELECTRON MICROSCOPY;
SURFACE PROPERTY;
VAPOR;
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EID: 1242306205
PISSN: 00032670
EISSN: None
Source Type: Journal
DOI: 10.1016/j.aca.2003.11.052 Document Type: Article |
Times cited : (10)
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References (28)
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