A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering

Surface and Coatings Technology

Volumn 187, Issue 1, 2004, Pages 122-130

  Mahieu, S ^a   De Winter, G ^a   Depla, D ^a   De Gryse, R ^a   Denul, J ^b  

^a GHENT UNIVERSITY   (Belgium)

^b Bekaert sa   (Belgium)

Author keywords

Direct current; Grain growth; Growth models; Magnetron; Oxides; Reactive sputtering

Indexed keywords

ANISOTROPY; GRAIN SIZE AND SHAPE; GROWTH (MATERIALS); MAGNETRON SPUTTERING; MOLECULAR ORIENTATION; SURFACE PROPERTIES;

BIAXIAL ALIGNMENT; LATERAL GROWTH; SURFACE MOBILITY;

ZIRCONIA;

COATING;

EID: 17744382668     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.01.008     Document Type: Article

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