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Journal of Crystal Growth

Volumn 271, Issue 3-4, 2004, Pages 462-468

Influence of the deposition parameters on the biaxial alignment of MgO grown by unbalanced magnetron sputtering

(5) Ghekiere, P a Mahieu, S a De Winter, G a De Gryse, R a Depla, D a

a GHENT UNIVERSITY (Belgium)

Author keywords

A1. Biaxial alignment; A1. Deposition parameters; A1. Unbalanced magnetron sputtering; B1. MgO

Indexed keywords

CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; OPTIMIZATION; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SUPERCONDUCTING MATERIALS;

BIAXIAL ALIGNMENT; DEPOSITION PARAMETERS; HIGH-TEMPERATURE SUPERCONDUCTING COPPER OXIDES (HTSC); ION BEAM ASSISTED DEPOSITION (IBAD);

MAGNESIA;

EID: 7544243895 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2004.08.010 Document Type: Article

Times cited : (11)

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