Charge injection and tunneling mechanism of solid state reaction silicon nanocrystal film

Applied Physics Letters

Volumn 89, Issue 11, 2006, Pages

  Lau, H W ^a   Tan, O K ^a   Trigg, D A ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; DISLOCATIONS (CRYSTALS); ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRIC SPACE CHARGE; ELECTRON ENERGY LEVELS; ELECTRON TUNNELING; GRAIN BOUNDARIES; HIGH RESOLUTION ELECTRON MICROSCOPY; MATHEMATICAL MODELS; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

EXPONENTIAL DISTRIBUTION; SILICON NANOCRYSTALS (SI NC); SOLID STATE REACTION; SPACE-CHARGE-LIMITED CURRENT (SCLC);

SEMICONDUCTING FILMS;

EID: 33748697012     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2345257     Document Type: Article

References (19)

1. S. Tiwari, F. Rana, H. Hanafi, A. Hartstein, E. F. Crabbe, and K. Chan, Appl. Phys. Lett. 68, 1377 (1996).
2. U. Avci and S. Tiwari, and I. Khan, Appl. Phys. Lett. 84, 2406 (2004).
3. Z. J. Horváth, Current Appl. Phys. 6, 145 (2006).
4. H. W. Lau, O. K. Tan, B. C. Ooi, Y. Liu, T. P. Chen, and D. Lu, J. Cryst. Growth 288, 92 (2006).
5. H. W. Lau, O. K. Tan, Y. Liu, C. Y. Ng, T. P. Chen, K. Pita, and D. Lu, J. Appl. Phys. 97, 104307 (2005).
6. H. W. Lau, O. K. Tan, Y. Liu, D. A. Trigg, and T. P. Chen, Nanotechnology 17, 4078 (2006).
7. Z. Shen, U. Koitshagen, and S. A. Campbell, J. Appl. Phys. 96, 2204 (2004).
8. M. A. Ratiq, Y. Tsuchiya, H. Mizuta, S. Oda, S. Uno, Z. A. K. Durrani, and W. I. Milne, Appl. Phys. Lett. 87, 182101 (2005).
9. H. Grabert, and M. H. Devoret, Single Charge Tunneling: Coulomb Blockage Phenomena in Nanostructures (Plenum, New York, 1992), Vol. 294.
10. K. Nishiguchi, X. Zhao, and S. Oda, J. Appl. Phys. 92, 2748 (2002).
11. H. E. Romero and M. Drndic, Phys. Rev. Lett. 95, 156801 (2005).
12. T. A. Burr, A. A. Seraphin, E. Werwa, and K. D. Kolenbrander, Phys. Rev. B 56, 4818 (1997).
13. A. Rose, Phys. Rev. 97, 1538 (1955).
14. Alkahest P. Mark and W. Helfrich, J. Appl. Phys. 33, 205 (1962).
15. V. Kumar, S. C. Jain, A. K. Kapoor, W. Greens, T. Aernauts, J. Poortmans, and R. Mertens, J. Appl. Phys. 94, 1283 (2003).
16. T. Kamiya, K. Nakahata, Y. T. Tan, Z. A. K. Durrani, and I. Shimuzu, J. Appl. Phys. 89, 6265 (2001).
17. Y. Shi, K. Saito, H. Ishikuro, and T. Hiramoto, J. Appi. Phys. 84, 2358 (1998).
18. L. Lu and M. O. Lai, Mechanical Alloying (Kluwer Acedemic, Boston, (1998).
19. R. A. M. Hikmet, D. V. Talapin, and H. Weller, J. Appl. Phys. 93, 3509 (2002).