Electrical characterization of amorphous silicon nanoparticles

Journal of Applied Physics

Volumn 96, Issue 4, 2004, Pages 2204-2209

  Shen, Z ^a   Kortshagen, U ^b   Campbell, S A ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

^b University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FRENKEL-POOLE EFFECTS; LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); SPACE CHARGED LIMITED CURRENT (SCLC); TRAP DISTRIBUTION;

AMORPHOUS SILICON; CARRIER MOBILITY; CHARGE TRANSFER; DATA REDUCTION; ELECTRIC POTENTIAL; PARAMETER ESTIMATION; PERMITTIVITY; PHOTOLITHOGRAPHY; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON WAFERS; SOLID STATE PHYSICS; TRANSMISSION ELECTRON MICROSCOPY;

NANOSTRUCTURED MATERIALS;

EID: 4344695692     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1763991     Document Type: Article

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