Technological plasmas

Physics World

Volumn 14, Issue 3, 2001, Pages 31-36

  Graham, Bill ^a,b  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^b EPSRC Technological Plasma Initiative   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001877399     PISSN: 09538585     EISSN: None     Source Type: Trade Journal    
DOI: 10.1088/2058-7058/14/3/28     Document Type: Article

References (6)

1. J-P Booth 1999 Optical and electrical diagnostics of fluorocarbon plasma etching processes Plasma Sources Sci. Technol. 8 249-257
2. U Czarnetzki, D Luggenhölscher and H F Döbele 1999 Space and time resolved electric field measurements in helium and hydrogen RF-discharges Plasma Sources Sci. Technol. 8 230-248
3. R Kinder and M J Kushner 2001 Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources J. Vac. Sci. Technol. A19 76
4. M A Lieberman and A J Lichtenberg 1994 Principles of Plasms Discharges and Materials Processing (Wiley, New York)
5. J R Roth 1995 Industrial Plasma Engineering (Institute of Physics Publishing, Bristol)
6. R J Shul and S J Pearton 2000 Handbook of Advanced Plasma Processing Techniques (Springer, Berlin)