Reactive pulsed laser deposition of hydrogenated carbon thin films: The effect of hydrogen pressure

Journal of Applied Physics

Volumn 100, Issue 4, 2006, Pages

  Budai, J ^a   Toth Z ^b   Juhasz A ^c   Szakacs G ^d   Szilagyi E ^d   Veres, M ^d   Koos M ^d  

^a UNIVERSITY OF SZEGED   (Hungary)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

^c EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^d WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CARBON; INFRARED SPECTROSCOPY; LASER PULSES; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TEMPERATURE;

AMORPHOUS CARBON FILMS; ELASTIC RECOIL DETECTION ANALYSIS; MEAN FREE PATH;

THIN FILMS;

EID: 33748319733     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2222401     Document Type: Article

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