Structural properties of carbon films deposited by pulsed ArF laser ablation: Effects of substrate temperature, bias and H2 pressure

Materials Science and Engineering B

Volumn B55, Issue 1-2, 1998, Pages 143-152

  Jayatissa, Ahalapitiya Hewage ^a   Sato, Fumio ^a   Saito, Nobuo ^a   Ohnishi, Hiroyuki ^a   Takizawa, Kuniharu ^a   Nakanishi, Yoichiro ^b   Yamaguchi, Tomuo ^b  

^a NHK SCIENCE AND TECHNICAL RESEARCH LABORATORIES   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Carbon films; Pulsed ArF laser ablation; Structural properties

Indexed keywords

ATOMIC FORCE MICROSCOPY; GRAPHITE; HYDROGEN; LASER ABLATION; NANOSTRUCTURED MATERIALS; PULSED LASER APPLICATIONS; RAMAN SPECTROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;

CARBON FILMS; DIAMOND-LIKE CARBON;

DIAMOND FILMS;

EID: 0001528867     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5107(98)00186-x     Document Type: Article

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