Investigation of Ohmic mechanism for chlorine-treated p-type GaN using x-ray photoelectron spectroscopy

Journal of Applied Physics

Volumn 100, Issue 4, 2006, Pages

  Chen, Po Sung ^a   Lee, Ching Ting ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINATION; ELECTRIC RESISTANCE; ELECTROLYSIS; OHMIC CONTACTS; SEMICONDUCTOR MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHLORINATED SURFACE TREATMENT; CONTACT RESISTANCE; OHMIC MECHANISM;

GALLIUM NITRIDE;

EID: 33748319687     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2336300     Document Type: Article

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