Physical properties of reactive sputtered tin-nitride thin films

Vacuum

Volumn 51, Issue 4, 1998, Pages 673-676

  Inoue, Y ^a   Nomiya, M ^a   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; GLASS; LATTICE CONSTANTS; PHYSICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE SPUTTERING; TIN NITRIDE;

TIN COMPOUNDS;

EID: 0032321197     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00271-1     Document Type: Article

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